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Transparent conductive film material ITO

TCO has a wide range of applications, mainly used in the fields of transparent electrodes of liquid crystal displays, touch screens, flexible OLED screens, optical waveguide components, and thin-film solar cells.

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The application of ITO in various fields revolves around its excellent properties of transparency and conductivity. The optical properties of ITO films are mainly affected by two factors: the optical band gap and the plasma oscillation frequency. The former determines the spectral absorption range, and the latter determines the spectral reflection range and intensity. In general, ITO has higher absorptivity in the short-wavelength region, higher reflectivity in the long-wavelength range, and highest transmittance in the visible light range. Taking 100nm ITO as an example, the average transmittance in the 400-900nm wavelength range is as high as 92.8%.

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The performance of ITO film is mainly determined by the preparation process, and heat treatment is often used as a means of auxiliary optimization. In order to obtain an ITO film with good conductivity, high transmittance and flat surface morphology, it is necessary to select appropriate deposition methods and optimize process parameters. Common coating methods include electron beam evaporation and magnetron sputtering.

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The main principle of electron beam evaporation: In a high vacuum environment, the high-energy electrons emitted by the electron gun will bombard the surface of the ITO target material under the action of the electric field and magnetic field to convert the kinetic energy into heat energy, and the target material will heat up and become a molten state or evaporate directly. , The ITO film is deposited on the surface of the substrate.

Magnetron sputtering belongs to the category of glow discharge and uses the principle of cathode sputtering for coating. The film particles originate from the cathode sputtering effect of argon ions on the cathode ITO target material in the glow discharge. After the argon ions sputter down the target atoms, they are deposited on the surface of the substrate to form the required ITO film.